Multi-state magnetoresistance random access cell with improved memory storage density

ABSTRACT

A multi-state magnetoresistive random access memory device having a pinned ferromagnetic region with a magnetic moment vector fixed in a preferred direction in the absence of an applied magnetic field, an non-ferromagnetic spacer layer positioned on the pinned ferromagnetic region, and a free ferromagnetic region with an anisotropy designed to provide a free magnetic moment vector within the free ferromagnetic region with N stable positions, wherein N is a whole number greater than two, positioned on the non-ferromagnetic spacer layer. The number N of stable positions can he induced by a shape anisotropy of the free ferromagnetic region wherein each N stable position has a unique resistance value.

This invention was made with Government support under Agreement No.MDA972-96 -3-0016 awarded by DARPA. The Government has certain rights inthe invention.

FIELD OF THE INVENTION

This invention relates to semiconductor memory devices and, moreparticularly, the present invention relates to semiconductor randomaccess memory devices that utilize a magnetic field.

BACKGROUND OF THE INVENTION

Traditional semiconductor memory devices store a memory state by storingan electronic charge. However, magnetoresistive random access memory(hereinafter referred to as “MRAM”) devices store a memory state byutilizing the direction of the magnetic moment vector created in amagnetic material or structure. Thus, a memory state in a MRAM device isnot maintained by power, but rather by the direction of the magneticmoment vector. To be commercially viable, however, MRAM must havecomparable memory density to current memory technologies, be scalablefor future generations, operate at low voltages, have low powerconsumption, and have competitive read/write speeds.

In previous MRAM technology, storing data is accomplished by applyingmagnetic fields and causing a magnetic material in a MRAM device to bemagnetized into either of two possible memory states. Thus, a singleMRAM device typically stores one bit of information and to increase thememory density, the MRAM device must be scaled laterally to smallerdimensions.

As the bit dimension shrinks, however, three problems occur. First, theswitching field increases for a given shape and film thickness,requiring more current to switch. Second, the total switching volume isreduced so that the energy barrier for reversal, which is proportionalto volume and switching field, drops. The energy barrier refers to theamount of energy needed to switch the magnetic moment vector from onestate to the other. The energy barrier determines the data retention anderror rate of the MRAM device and unintended reversals can occur due tothermal fluctuations if the barrier is too small. Finally, because theswitching field is produced by shape, the switching field becomes moresensitive to shape variations as the bit shrinks in size. Withphotolithography scaling becoming more difficult at smaller dimensions,MRAM devices will have difficulty maintaining tight switchingdistributions.

Accordingly, it is an object of the present invention to provide a newand improved magnetoresistive random access memory device which canstore multiple states.

SUMMARY OF THE INVENTION

To achieve the objects and advantages specified above and others, amulti-state MRAM cell is disclosed. In the preferred embodiment, themulti-state MRAM cell has a resistance and includes a multi-state MRAMdevice sandwiched therebetween a first conductive line and a baseelectrode. Further, a second conductive line is positioned proximate tothe base electrode. In the preferred embodiment, the multi-state MRAMdevice includes a pinned synthetic anti-ferromagnetic region positionedadjacent to the base electrode. The pinned synthetic anti-ferromagneticregion includes an anti-ferromagnetic pinning layer and a pinnedferromagnetic layer which has a pinned magnetic moment vector orientedin a preferred direction at a first nonzero angle relative to the firstconductive line. Further, a non-ferromagnetic spacer layer is positionedon the pinned synthetic anti-ferromagnetic region.

A free ferromagnetic region is positioned on the non-ferromagneticspacer layer and adjacent to the second conductive line. The freeferromagnetic region has a free magnetic moment vector that is free torotate in the presence of an applied magnetic field and, in thepreferred embodiment, has a shape designed to allow more than two, e.g.four, stable states, as will be discussed presently.

In the preferred embodiment, the free magnetoresistive region includes atri-layer structure that includes an anti-ferromagnetic coupling spacerlayer sandwiched therebetween two ferromagnetic layers. Further, thepurpose of the first conductive line is to act as a bit line and thepurpose of the second conductive line is to act as a switch line. Theseconductive lines supply current pulses to the MRAM device to induce amagnetic field for aligning the free magnetic moment vector in a desiredstate.

The multiple states of the MRAM device are created by an inducedanisotropy within the free ferromagnetic region. In the preferredembodiment, the shape of the free ferromagnetic region is chosen tocreate multiple magnetic states wherein a first hard axis is orientedparallel with the first conductive region and a second hard axis isoriented parallel with the second conductive region. Consequently, thefree magnetic moment vector will not be stable in either of these twodirections.

Also, in the preferred embodiment, the shape of the free ferromagneticregion is chosen so that a first easy axis and a second easy axis areboth oriented at nonzero angles to the first hard axis, the second hardaxis, and the pinned magnetic moment vector. The first easy axis and thesecond easy axis are also chosen to be oriented at a 90° angle relativeto each other. The first easy axis creates a first stable position and athird stable position wherein the first stable position and the thirdstable position are oriented anti-parallel along the first easy axis.The second easy axis creates a second stable position and a fourthstable position wherein the second stable position and the fourth stableposition are oriented anti-parallel along the second easy axis.

Thus, in the preferred embodiment, four stable positions have beencreated by the shape induced anisotropy of the free ferromagneticregion. However, it will be understood that other methods can be used tocreate more than two stable positions in the free ferromagnetic region.Further, the resistance of the MRAM device depends on which stableposition the free magnetic moment vector is aligned with because eachstable position is oriented at a unique angle relative to the pinnedmagnetic moment vector. Hence, the four stable positions can be measuredby measuring the resistance of the MRAM device.

BRIEF DESCRIPTION OF THE DRAWINGS

The foregoing and further and more specific objects and advantages ofthe instant invention will become readily apparent to those skilled inthe art from the following detailed description of a preferredembodiment thereof taken in conjunction with the following drawings:

FIG. 1 is a sectional view of a multi-state magnetoresistive randomaccess memory device in accordance with the present invention;

FIG. 2 is plan view of the multi-state magnetoresistive random accessmemory device illustrated in FIG. 1 in accordance with the presentinvention;

FIG. 3 is a graph illustrating the resistance values of a multi-statemagnetoresistive random access memory device in the various states;

FIG. 4 is a graph illustrating the various current pulses used to writeto a multistate magnetoresistive random access memory device;

FIG. 5 is a section view of another embodiment of a multi-statemagnetoresistive random access memory device in accordance with anotherembodiment.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

Turn now to FIG. 1, which illustrates a simplified sectional view of amulti-state MRAM cell 5 in accordance with the present invention.Multi-state MRAM cell 5 includes a multi-state MRAM device 7 sandwichedtherebetween a base electrode 14 and a conductive line 36 whereinmulti-state MRAM device 7 has a resistance, R. Further, a conductiveline 12 is positioned proximate to base electrode 14 and an isolationtransistor 10 is electrically connected to base electrode 14 and anelectrical ground 13 as illustrated.

Multi-state MRAM device 7 includes a pinned synthetic anti-ferromagneticregion 19 positioned adjacent to base electrode 14. Pinned syntheticanti-ferromagnetic region 19 includes an anti-ferromagnetic pinninglayer 16 positioned on base electrode 14, a pinned ferromagnetic layer17 positioned on layer 16, an anti-ferromagnetic coupling layer 18positioned on layer 17, and a fixed ferromagnetic layer 22 positioned onlayer 18. Further, fixed ferromagnetic layer 22 has a fixed magneticmoment vector 20 oriented in a fixed preferred direction (see FIG. 3) ata first nonzero angle relative to conductive line 36. It will beunderstood that region 19 can be substituted by many configurations,including using a single fixed layer, and the use of four layers in thisembodiment is for illustrative purposes only.

A non-ferromagnetic spacer layer 24 with a thickness is positioned onpinned synthetic anti-ferromagnetic region 19. It will be understoodthat non-ferromagnetic spacer layer 24 can include multiple layers, butis shown as one layer for illustrative purposes. Also, it will beunderstood that non-ferromagnetic spacer layer 24 can include adielectric material, such as aluminum oxide (AlO), wherein multi-stateMRAM device 7 behaves as a tunneling junction device. Layer 24 istypically thin enough to allow a spin polarized tunneling current toflow between fixed ferromagnetic layer 22 and ferromagnetic layer 28. Inother embodiments, non-ferromagnetic spacer layer 24 can include aconductive material, such as copper (Cu), wherein multi-state MRAMdevice 7 behaves as a giant magnetoresistive device. In general,however, non-ferromagnetic spacer layer 24 can include any suitablenon-ferromagnetic material which results in a device with a substantialmagnetoresistive ratio.

A free ferromagnetic region 26 is positioned on non-ferromagnetic spacerlayer 24 and adjacent to conductive line 36. Ferromagnetic layer 28 hasa free magnetic moment vector 30 that is free to rotate in the presenceof an applied magnetic field. In the preferred embodiment, freeferromagnetic region 26 is designed to provide free magnetic momentvector 30 with more than two stable positions, as will be discussedpresently. In the preferred embodiment, free magnetoresistive region 26includes a tri-layer structure that includes an anti-ferromagneticcoupling spacer layer 32 sandwiched therebetween a ferromagnetic layer28 and a ferromagnetic layer 34.

It will be understood that free magnetoresistive region 26 can includemore than three layers and that the use of three layers in thisembodiment is for illustrative purposes only. For example, a five-layerstack of a ferromagnetic layer/anti-ferromagnetic coupling spacerlayer/ferromagnetic layer/anti-ferromagnetic coupling spacerlayer/ferromagnetic layer could also be used. Further, it will beunderstood that region 26 could include less than three layers such as asingle free ferromagnetic layer.

It will also be understood that the free ferromagnetic layer 26 and thepinned synthetic anti-ferromagnetic layer 19 can have their positionsexchanged in multi-state MRAM device 7 (See FIG. 5). The freeferromagnetic layer 26 would be positioned on the base electrode 14, thenon-ferromagnetic spacer layer 24 would be positioned on the freeferromagnetic layer 26, and the pinned synthetic anti-ferromagneticlayer 19 would be positioned between the non-ferromagnetic spacer layer24 and the conductive line 36.

In the preferred embodiment, pinned ferromagnetic layer 22 andferromagnetic layer 28 have a split band structure with respect toelectron spin that causes polarization of the conduction band electrons.In general, any material with a split band structure resulting in spinpolarization of the conduction band electrons can be included in layers22 and 28. The spin polarization of these materials results in a devicestructure that depends on the relative orientation of magnetic momentvectors 20 and 30. Further, in some embodiments, at least one of fixedferromagnetic layer 22 and free ferromagnetic layer 28 can includehalf-metallic materials. It is well known to those skilled in the artthat half-metallic materials ideally have 100% spin polarization, but inpractice typically have at least 80% spin polarization. The use ofhalf-metallic materials greatly increases a signal-to-noise ratio ofmulti-state MRAM cell 5.

Turn now to FIG. 2 which illustrates a simplified plan view ofmulti-state MRAM cell 5. To simplify the description of the operation ofmulti-state MRAM device 7, all directions will be referenced to an x-and y-coordinate system 40 as shown. In coordinate system 40, an angle θis defined to be 0° along the positive x-axis, 90° along the positivey-axis, 180° along the negative x-axis, and 270° along the negativey-axis.

Further, in the preferred embodiment, a bit current, I_(B), is definedas being positive if flowing in the positive x-direction and a switchcurrent, I_(S), is defined as being positive if flowing in the positivey-direction. The purpose of conductive line 12 and conductive line 36 isto create a magnetic field that acts upon multi-state MRAM device 7.Positive bit current, I_(B), will induce a circumferential bit magneticfield, H_(B), and positive switch current, I_(S), will induce acircumferential switch magnetic field, H_(S). Since conductive line 36is above multi-state MRAM device 7, in the plane of the element, H_(B)will be applied to multi-state MRAM device 7 in the positive y-directionfor positive bit current, I_(B). Similarly, since conductive line 12 ispositioned below multi-state MRAM device 7, in the plane of the element,H_(S) will be applied to multi-state MRAM device 7 in the positivex-direction for positive switch current, I_(S).

It will be understood that the definitions for positive and negativecurrent flow are arbitrary and are defined here for illustrativepurposes and convenience. The effect of reversing the current flow is tochange the direction of the magnetic field induced within multi-stateMRAM device 7. The behavior of a current induced magnetic field is wellknown to those skilled in the art and will not be elaborated uponfurther here.

As discussed previously, free ferromagnetic region 26 is designed toprovide free magnetic moment vector 30 with more than two stablepositions. One method to create more than two stable positions is tomanipulate the shape of free ferromagnetic region 26. For example, inone embodiment, free ferromagnetic region 26 can have a shape that isdefined by a polar equation given as r(θ)=1+|A·cos(N·θ−α)|, wherein N isapproximately half the number of stable positions and is a whole numbergreater than one, θ is an angle relative to conductive lines 12 and 36,r is a distance in polar coordinates that is a function of the angle θin degrees, α is an angle in degrees that determines the angle of thelobes with respect to conductive line 12, and A is a constant. The angleθ has continuous values in the range between 0° and 360° and, in thisembodiment, the constant A has a value between 0.1 and 2.0.

In the preferred embodiment, the equation for polar function r(θ) ischosen so that at least one lobe is oriented parallel with conductiveline 12 (i.e. θ=90°). It will be understood that polar function r(θ)traces out the outer edge of free ferromagnetic region 26 to illustratethe basic shape of the region and not the dimensions. Also, it will beunderstood that other equations are possible to describe the basic shapeand that other shapes are possible to induce a shape anisotropy thatcreates more than two stable states.

In general, however, other methods of inducing an anisotropy could beused alone or in combination with shape anisotropy. For example, anintrinsic anisotropy of a magnetic material included in freeferromagnetic region 26, generally thought to arise from atomic-levelpair ordering, can be used. Also, the direction of the intrinsicanisotropy can be set by applying a magnetic field during deposition offree ferromagnetic region 26 or during a post deposition anneal. Amagnetocrystalline anisotropy of the magnetic material included in freeferromagnetic region 26 could also be used by growing a magneticmaterial with a preferred crystalline orientation. Further, ananisotropy induced by certain anisotropic film growth methods could alsobe used to induce an anisotropy wherein the induced anisotropy isthought to originate from a shape asymmetry of the growing clusters orcrystallites.

However, it will be understood that in the preferred embodiment, theanisotropy of free ferromagnetic region 26 is created by a shapeanisotropy. A shape anisotropy is used in the preferred embodiment forillustrative purposes only and it will be understood that other methodsare available to create an anisotropy, and, consequently, more than twostable states in free ferromagnetic region 26.

In the preferred embodiment, it is assumed that multi-state MRAM cell 5illustrated in FIG. 2 has four stable states wherein N is equal to four,A is equal to 0.5, and α is equal to 180°, and that the four stablestates are created by the shape anisotropy of free ferromagnetic region26. Further, it is assumed that the shape of free magnetoresistiveregion 26 induces an easy axis 44 and an easy axis 42 which are orientedat a nonzero angle relative to one another, wherein the nonzero angle is90° in the preferred embodiment. Further, easy axis 44 and easy axis 42are oriented at a nonzero angle relative to pinned magnetic momentvector 20 (not shown), conductive line 36, and conductive line 12.

Also in the preferred embodiment, it is assumed that the shape of freemagnetoresistive region 26 induces a hard axis 46 and a hard axis 48wherein hard axis 46 is oriented parallel to conductive line 36 and hardaxis 48 is oriented parallel to conductive line 12. It will beunderstood that the magnetization directions of the stable states may becomplex, with the magnetization bending or curling to minimize itsenergy, but it is assumed for illustrative purposes that themagnetization directions in this embodiment are oriented 90° apart alongeasy axes 42 and 44, as discussed above.

Further, it will be understood that the magnetization is not generallyuniform in the same direction over the area of the bit, but is assumedto be uniform in this embodiment for simplicity. Thus, for simplicity,the easy axis is defined as being an axis which is oriented with acenter of MRAM cell 5 when the magnetic moment vector is in a stablerest state.

In this embodiment, easy axis 44 creates a stable position 50 and astable position 56 and easy axis 42 creates a stable position 52 and astable position 54. Hence, stable position 54 is oriented 90° relativeto stable position 56, stable position 50 is oriented 180° relative tostable position 56, and stable position 52 is oriented 270° relative tostable position 56. Thus, in this embodiment, four stable positions havebeen created in free magnetoresistive region 26 for free magnetic momentvector 30 to align with. It will be understood that the angles betweenadjacent stable positions are chosen to be 90° for illustrative purposesand other angles could be chosen.

The relationships between free magnetic moment vector 30 and theresistance are illustrated in graph 81 in FIG. 3 where free magneticmoment vector 30 is shown oriented in stable positions 50, 52, 54, and56 along a R-axis. The R-axis is defined as a resistance axis directedanti-parallel with the direction of pinned magnetic moment vector 20.

Resistance, R, of multi-state MRAM cell 5 depends on the position offree magnetic moment vector 30 relative to pinned magnetic moment vector20. It is well known by those skilled in the art that the resistance ofa magnetoresistive device, such as a magnetic tunnel junction or a spinvalve device, varies between a minimum value, R_(min), and a maximumvalue, R_(max), by approximately as the cosine of an angle, φ, betweenmagnetic moment vectors 20 and 30 according to the relationship given as

$R \approx {{\frac{1}{2}\left( {R_{\min} + R_{\max}} \right)} - {\frac{1}{2}\left( {R_{\max} - R_{\min}} \right){{\cos(\phi)}.}}}$R is at its maximum value, R_(max), when vectors 20 and 30 areanti-parallel (i.e. φ=180°) so that cos(φ))=−1. R is at its minimumvalue, R_(min), when vectors 20 and 30 are parallel (i.e. φ=0°) so thatcos(φ))=1. It is further understood by those skilled in the art that ifone of layers 22 or 28 has an opposite polarization of the conductionelectrons then the principles of the device are unchanged, but the signof the cosine dependence is opposite. This mathematical cosinerelationship is shown graphically as the projection of the magneticmoment vector 20 on the R-axis in graph 81.

In the preferred embodiment, R has a value R₁₁ when free magnetic momentvector 30 is in stable position 56, a value R₀₁ when free magneticmoment vector 30 is held in stable position 54, a value R₀₀ when freemagnetic moment vector is held in stable position 50, and a value R₁₀when free magnetic moment vector is held in stable position 52. Further,it will be understood that in this illustration R₀₀<R₀₁<R₁₀<R₁₁.

For example, if free magnetic moment vector 30 is oriented in stableposition 50, then multi-state MRAM device 7 has a resistance value ofR₀₀, which is the projection of free magnetic moment vector 30 in stableposition 50 onto the R-axis. Similarly, the projections of magneticmoment vector 30 in stable positions 52, 54, and 56 have correspondingresistance values of R₁₀, R₀₁, and R₁₁, respectively. Thus, the state ofmulti-state MRAM device 7 can be read by measuring its resistance.

The method of writing to multi-state MRAM cell 5 involves supplyingcurrents in conductive line 12 and conductive line 36 such that freemagnetic moment vector 30 can be oriented in one of four stablepositions in the preferred embodiment. To fully elucidate the writingmethod, specific examples describing the time evolution ofcircumferential bit magnetic field, H_(B), and circumferential switchmagnetic field, H_(S), are now given.

Turn now to FIG. 4 which illustrates a magnetic pulse sequence 100.Illustrated are the magnetic pulse sequences used to write multi-stateMRAM cell 5 to various states. The writing method involves applyingcurrent pulses in conductive line 12 and conductive line 36 to rotatefree magnetic moment vector 30 in a direction parallel to one of thefour stable positions in the preferred embodiment. The current pulsesare then turned off so that free magnetic moment vector 30 is aligned inone of the four stable positions.

It will be understood that for a memory array one can arrange aplurality of MRAM cells on a grid with lines 12 and 36 electricallyconnected to an array of cells arranged in rows and columns to form across point array. With multi-state MRAM cells, as with conventional twostate MRAM cells, the bits ideally must not switch when exposed to afield generated by a single conductive line. It is desired to have onlythe bit which is at the cross-point of two active conductive lines beswitched.

In the preferred embodiment, MRAM cell 5 requires a much higher magneticfield to switch 180° compared to 90°. The currents used for writing aredesigned to generate magnetic fields that are above the threshold for90° switching but below the threshold required for 180° switching. Inthis way a sequence of current pulses can be applied to the lines thatwill switch only the MRAM cell at the cross-point and will move itsmagnetic moment vector in a sequence of 0° and/or 90° switches until itreaches the desired final state regardless of the initial state.

In FIG. 4, for example, the longer pulses of H_(B) determine if thefinal state will be in the negative or positive y-direction while thebipolar pulse of H_(S) determines if the final state will be in thepositive or negative x-direction. Due to the symmetry of MRAM cell 5, anequivalent writing scheme can be constructed by reversing the roles ofH_(S) and H_(B) so that H_(S) pulses are long and H_(B) pulses are shortand bipolar. If δ is the duration of a short pulse, δ=t_(i+1)−t₁, thenthe total duration of the write cycle shown in FIG. 4 is 4·δ. Since theactive part of the cycle for any given bit is only the part of the cyclewith the bipolar pulses on H_(S), the same result could be obtained withslightly different write circuitry that only executes the active part ofthe cycle needed to write the desired state. Thus the total cycle timecan be reduced to 2·δ.

It is understood by those skilled in the art that the current pulses ina circuit may have variations in shape and duration, such as finite risetime, overshoot, and finite separation between pulses and therefore maynot appear exactly as illustrated in FIG. 4.

One principle of operation in writing to MRAM cell 5 is having a singlelong pulse on one conductive line coincident with a bipolar pulse onanother conductive line to move the magnetic moment of the MRAM bit tothe desired state. In particular, a finite separation between thecurrent pulses may be desirable so that the magnetic state of the freelayer moves to an equilibrium state before the beginning of the nextcurrent pulse.

For example, by using a magnetic pulse sequence 102 for H_(S) and amagnetic pulse sequence 112 for H_(B), multi-state MRAM cell is writteninto a ‘11’ state. In particular, at a time t₀, H_(B) is pulsed to anegative value while H_(S) is zero. Since only one write line is on, themagnetic moment of the MRAM bit will not change states.

At a time t₂, H_(B) is pulsed to a positive value while H_(S) is pulsedto a negative value. If the initial state was in direction 56 or 50,then this will cause a 90 rotation of the magnetic moment direction 54.If the initial state is 54 or 52, then there will be no rotation. At atime t₃ when the negative H_(S) pulse is complete, the bit can only beoriented with its magnetic moment substantially along axis 42 in FIG. 2.At time t₃, H_(B) is kept at its positive value while H_(S) is pulsed toa positive value. This has the effect of orienting free magnetic momentvector 30 toward direction 56. At a time t₄, H_(B) and H_(S) are bothmade zero so a magnetic field force is not acting upon free magneticmoment vector 30 and the moment settles into equilibrium position 56. Itwill be understood that in this illustration t₀<t₁<t₂<t₃<t₄.

Consequently, free magnetic moment vector 30 will become oriented in thenearest stable position to minimize the anisotropy energy, which in thiscase is stable position 56. As discussed previously and illustratedgraphically in FIG. 3, stable position 56 is defined as the ‘11’ state.Hence, multi-state MRAM cell 5 has been programmed to store a ‘11’ byusing magnetic pulse sequences 102 and 112. Similarly, multi-state MRAMcell 5 can be programmed to store a ‘10’ by using magnetic pulsesequences 104 and 112, to store a ‘01’ by using magnetic pulse sequences106 and 112, and to store a ‘00’ by using magnetic pulse sequences 108and 112. It will be understood that the states used in this illustrationare arbitrary and could be otherwise defined.

Thus, multi-state MRAM cell 5 can be programmed to store multiple stateswithout decreasing the dimensions of multi-state MRAM cell 5.Consequently, in the preferred embodiment, the memory storage density isincreased by a factor of two. Also, a writing method has beendemonstrated in the preferred embodiment so that one of four possiblestates can be stored in the MRAM device regardless of the initial storedstate.

Various changes and modifications to the embodiments herein chosen forpurposes of illustration will readily occur to those skilled in the art.To the extent that such modifications and variations do not depart fromthe spirit of the invention, they are intended to be included within thescope thereof which is assessed only by a fair interpretation of thefollowing claims.

1. A multi-state magnetoresistive random access memory device having aresistance, the device comprising: a substrate; a first conductive linepositioned on the substrate; a fixed ferromagnetic region positionedproximate to the first conductive line, the fixed ferromagnetic regionhaving a fixed magnetic moment vector fixed in a preferred directionboth with and without an applied magnetic field; a non-ferromagneticspacer layer positioned on the fixed ferromagnetic region; a freeferromagnetic region positioned on the non-ferromagnetic spacer layer,the free ferromagnetic region having a free magnetic moment vector thatis free to rotate in the presence of an applied magnetic field and wherethe free ferromagnetic region has an anisotropy that creates more thantwo stable positions for the free magnetic moment vector wherein themore than two stable positions are oriented relative to the preferreddirection of the fixed magnetic moment vector such that each positionproduces a unique resistance; and a second conductive line positioned ata non-zero angle to the first conductive line.
 2. An apparatus asclaimed in claim 1 wherein the anisotropy of the free ferromagneticregion is created by the shape of the free ferromagnetic region.
 3. Anapparatus as claimed in claim 2 wherein the shape of the freeferromagnetic region is defined approximately by a polar equation givenas r(θ)=1+|A·cos(N·θ−α) |, wherein N is a whole number, θ is an angle indegrees relative to the first and second conductive lines, r is adistance in polar coordinates that is a function of the angle θ, α is anangle in degrees that determines the angle of the lobes relative to thefirst conductive line, and A is a constant.
 4. An apparatus as claimedin claim 3 wherein the constant A has a value between 0.1 and 2.0.
 5. Anapparatus as claimed in claim 2 wherein the shape of the freeferromagnetic layer has at least one lobe oriented parallel to the firstconductive line.
 6. An apparatus as claimed in claim 3 wherein the angleθ has continuous values in the range between 0° and 360°.
 7. Anapparatus as claimed in claim 1 wherein at least one of the pinnedferromagnetic region and the free ferromagnetic region includes one ofiron oxide (Fe₃O₄), chromium oxide (CrO₂), oxides, and semiconductors,wherein the oxides and semiconductors are doped with one or more ofiron, cobalt, nickel, magnesium, and chromium.
 8. An apparatus asclaimed in claim 1 wherein the anisotropy of the free ferromagneticregion is created by an intrinsic anisotropy of a material included inthe free ferromagnetic region.
 9. An apparatus as claimed in claim 8wherein the intrinsic anisotropy is created by applying a magnetic fieldto the free ferromagnetic region.
 10. An apparatus as claimed in claim 1wherein the anisotropy of the free ferromagnetic region is created bygrowing the free ferromagnetic region with a preferred crystallineorientation.
 11. An apparatus as claimed in claim 1 wherein theanisotropy of the free ferromagnetic region is created by growing thefree ferromagnetic region with clusters or crystallites that have ashape anisotropy.
 12. An apparatus as claimed in claim 1 wherein themore than two stable positions are oriented at a nonzero angle relativeto the first and second conductive lines.
 13. An apparatus as claimed inclaim 1 wherein the magnetic moment of the fixed ferromagnetic region isat a non-zero angle relative to the first and second conductive lines.14. An apparatus as claimed in claim 1 wherein the stable positions areinduced by a shape anisotropy of the free ferromagnetic region.
 15. Anapparatus as claimed in claim 1 wherein the anisotropy of the freeferromagnetic region is created by the free ferromagnetic region havingclusters or crystallites that have a shape anisotropy.
 16. A multi-statemagnetoresistive random access memory device comprising: a substrate; afirst conductive line positioned proximate to the base electrode; a freeferromagnetic region positioned proximate to the first conductive line,the free ferromagnetic region having a free magnetic moment vector thatis free to rotate in the presence of an applied magnetic field and wherethe free ferromagnetic region has an anisotropy that creates more thantwo stable positions for the free magnetic moment vector wherein themore than two stable positions are oriented relative to the preferreddirection of the fixed magnetic moment vector such that each positionproduces a unique resistance; a non-ferromagnetic spacer layerpositioned on the free ferromagnetic region; a fixed ferromagneticregion positioned on the non-ferromagnetic spacer layer, the fixedferromagnetic region having a fixed magnetic moment vector fixed in apreferred direction both with and without an applied magnetic field; anda second conductive line positioned at a non-zero angle to the firstconductive line.
 17. An apparatus as claimed in claim 16 wherein theshape of the free ferromagnetic layer has at least one lobe orientedparallel to the first conductive line.
 18. An apparatus as claimed inclaim 14 wherein the shape of the free ferromagnetic region is definedapproximately by a polar equation given as r(θ)=1+|A·cos(N·θ−α)|,wherein N is a whole number, θ is an angle in degrees relative to thefirst and second conductive lines, r is a distance in polar coordinatesthat is a function of the angle θ, α is an angle in degrees thatdetennines the angle of the lobes relative to the first conductive line,and A is a constant.
 19. An apparatus as claimed in claim 18 wherein theconstant A has a value between 0.1 and 2.0.
 20. An apparatus as claimedin claim 18 wherein the angle θ has continuous values in the rangebetween 0° and 360°.
 21. An apparatus as claimed in claim 18 wherein thestable positions are induced by a shape anisotropy of the freeferromagnetic region.
 22. An apparatus as claimed in claim 18 whereinthe number of stable positions is equal to four.
 23. An apparatus asclaimed in claim 16 wherein the anisotropy of the free ferromagneticregion is created by an intrinsic anisotropy of a material included inthe free ferromagnetic region.
 24. An apparatus as claimed in claim 23wherein the intrinsic anisotropy is created by applying a magnetic fieldto the free ferromagnetic region.
 25. An apparatus as claimed in claim16 wherein the anisotropy of the free ferromagnetic region is created bygrowing the free ferromagnetic region with a preferred crystallineorientation.
 26. An apparatus as claimed in claim 16 wherein theanisotropy of the free ferromagnetic region is created by growing thefree ferromagnetic region with clusters or crystallites that have ashape anisotropy.
 27. An apparatus as claimed in claim 16 wherein atleast one of the pinned ferromagnetic region and the free ferromagneticregion includes one of iron oxide (Fe₃O₄), chromium oxide (CrO₂),oxides, and semiconductors, wherein the oxides and semiconductors aredoped with one or more of iron, cobalt nickel, magnesium, and chromium.28. An apparatus as claimed in claim 16 wherein the non-ferromagneticspacer layer includes one of a dielectric material, such as aluminumoxide, and a conductive material such as copper.
 29. An apparatus asclaimed in claim 16 wherein the more than two stable positions areoriented at a nonzero angle relative to the first and second conductivelines.